Measurement of the Electron Temperature in Dielectric Barrier Discharge by Line - Ratio Method of Optical Emission Spectroscopy

Authors

  • R.B. Tyata Department of Electrical Engineering, Khwopa College of Engineering, Libali-2, Bhaktapur, Nepal Author
  • D.P. Subedi Department of Natural Science, Kathmandu University, Dhulikhel, Nepal Author
  • C.S. Wong Plasma Technology Research Centre, Physics Department, University of Malaya, 50603 Kuala Lumpur, Malaysia Author

DOI:

https://doi.org/10.3126/jsce.v3i0.22382

Keywords:

Infilled frame, masonry infill, stiffener, gap elements, equivalent diagonal strut width

Abstract

In this paper, experimental results of atmospheric pressure dielectric barrier discharge (DBD) produced in air and nitrogen gas have been presented. The discharge was generated using a high voltage (0-20 kV) power supply operating at 10-30 kHz in hemispherical electrodes system with dielectric barrier of glass between the electrodes. Optical emission spectroscopy was used for the characterization of the discharge produced at atmospheric pressure. The emission spectra in the range of 200 nm to 450 nm have been analyzed to estimate the electron temperature by line intensity ratio method. The results show that the electron temperature is about 0.70 eV in air and 0.71 in nitrogen.

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Published

2015-12-01

Issue

Vol. 3 (2015)

Section

Research Papers

Categories

License

Copyright (c) 2015 Khwopa Engineering College and Khwopa College of Engineering

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

This license allows reusers to copy and distribute the material in any medium or format in unadapted form only, for noncommercial purposes only, and only so long as attribution is given to the creator.

How to Cite

Tyata, R., Subedi, D., & Wong, C. (2015). Measurement of the Electron Temperature in Dielectric Barrier Discharge by Line - Ratio Method of Optical Emission Spectroscopy. Journal of Science and Engineering (JScE), 3, 1-6. https://doi.org/10.3126/jsce.v3i0.22382